
By Kiyotaka Wasa
ISBN-10: 0815512805
ISBN-13: 9780815512806
ISBN-10: 0815517734
ISBN-13: 9780815517733
A concise, accomplished assessment of sputter deposition technology?a key expertise for fabrics examine within the subsequent decade. Cathode sputtering is regular within the microelectronics for silicon built-in circuit construction and for metallurgical coatings. extreme temperature superconductors will be synthesized with sputtering less than non-equilibrium stipulations. Diamond movies and ferroelectric fabrics are different purposes.
Read Online or Download Handbook of Sputter Deposition Technology: Principles, Technology and Applications (Materials Science and Process Technology Series) PDF
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Extra resources for Handbook of Sputter Deposition Technology: Principles, Technology and Applications (Materials Science and Process Technology Series)
Example text
008 7-8 lO-
VAC. 22: Plasma Assisted Chemical Vapor Deposition (PACVD): S, substrate; P, plasma. Electron-neutrals exci tation dissociation ionization dissociati ve ionization electron attachment dissociati ve attachment e- + A -+ A* + e- e-+AB-+A+B+ee-+ A -+ A++ 2e- e-+AB-A++B+2e e-+A -+A e-+AB-A-+B Electron-lons recombination e-+A+ dlssociati ve recombina tion e-+A+B-+A+B -+A Metastable collisions A * + G - G+ + A + e Ar* + Ar* - Ar + Ar+ + e e + Ar* ... 23: Plasma enhanced chemical reactions. Several improved PACVD processes have recently been developed.
SP . 1: Periodic table with deposition conditions. EU 63 151. 8x 10 2225 "1707 EB . SP ---------------1 _ _ _ _--.. j Ib fcc IEB. 14 EB. SP EB. 183 1. 948 1. 9984 1. 96 1. 81 Si 14 (1. 2) dia hcp fet hex rmb fcc ort BO(W). 5 231. 6) fcc EB. 272 116 1356 "1147 (bed £B hcp £'3. 8 107 271. 2: Special features of deposition processes. The crystalline properties of the deposited films are controlled by the selection of the substrate materials and the substrate temperature. Amorphous thin filnls are prepared on a glass and/or ceramic substrate at substrate temperatures below the crystallization tenlperature of the thin films.