Download Thin Film Materials Technology: Sputtering of Compound by Bruce Eckel PDF

By Bruce Eckel

ISBN-10: 0131872486

ISBN-13: 9780131872486

A useful source for commercial technology and engineering novices to sputter deposition know-how in skinny movie creation purposes, this booklet is wealthy in insurance of either ancient advancements and the latest experimental and technological information regarding ceramic skinny movies, a key expertise for nano-materials in high-speed details functions and large-area practical coating comparable to car or ornamental portray of plastic elements, between different issues. In seven concise chapters, the e-book completely experiences uncomplicated skinny movie know-how and deposition strategies, sputtering procedures, structural keep an eye on of compound skinny motion pictures, and microfabrication by way of sputtering.

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Extra resources for Thin Film Materials Technology: Sputtering of Compound Materials

Example text

A typical system is shown in Fig. 20. A medium-frequency power source is connected to the twin targets. The targets act as anode and cathode alternatively at the frequency of several tens of kilohertz, and deposition can be carried out with no appreciable decrease in the deposition rate. In these glow-discharge systems, sputtering gas molecules, during thin-film growth, irradiate the sputtered films. This causes the inclusion of the gas molecules in the sputtered films. In ion beam sputtering systems, incident ions are generated at the ion source.

A typical construction is shown in Fig. 25. 23. Chemical vapor deposition (CVD). 24. Plasma assisted chemical vapor deposition (PACVD). 1. 25. ECR plasma assisted chemical vapor deposition. [27] These CVD reactions are activated by the irradiation of ultraviolet laser light without the application of electric power. Among these deposition processes, ion-assisted depositions such as sputtering, ion plating, and PACVD are called ion processes as shown in Fig. 2 Deposition Conditions Most thin films are deposited by evaporation (vacuum deposition), sputtering, and/or chemical vapor deposition.

The source materials are evaporated by a resistively heated filament or boat, generally made of refractory metals such as W, Mo, or Ta, with or without ceramic coatings. Crucibles of quartz, graphite, alumina, beryllia, boron-nitride, or zirconia are used with indirect heating. The refractory metals are evaporated by electron-beam deposition since simple resistive heating cannot evaporate high melting point materials. Thin Film Processes 35 Pulsed laser deposition (PLD) is an improved thermal process used for the deposition of alloys and/or compounds with a controlled chemical composition.

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